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    • 4 inches
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  • Epitaxial film thickness (0.5 ~ 150um)

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PRODUCT AND APPLICATIONS

Si Epitaxial Products


 

Products and Applications


 

 

PRODUCT USE

On epitaxial wafers

Silicon epitaxial wafers grow one or more layers of silicon single crystal films on polished silicon single crystal wafers by vapor phase chemical reaction at high temperature. Epitaxial layers with different resistivity, thickness and types can be obtained by controlling growth conditions. It is an important basic material for manufacturing various silicon integrated circuits and discrete devices.

 

图片展示

Epitaxial wafer applications

 

                    Discrete(Bipolar,Schottky,Power MOS,lGBT,FRD

                    CMS lC

                    bipolar lC

 

Product parameters

Epitaxial doping value: p-type boron; N-type phosphorus

Epitaxial size: 4-12 inch

Epitaxial layer thickness: 0.5-150 um

Epitaxial layer resistivity: 0.02-1000 ohm cm

Orientation: (100), (111)

 

Application of semiconductor devices

 

In this era of highly developed information technology, mobile phones, computers, televisions, solar cells can be seen everywhere. The operation of these electrical appliances is inseparable from integrated circuits. Therefore, as the base material of integrated circuit, silicon wafer is very important for the development of information industry.

 

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